Apparatus and method for supplying chemicals in chemical mechanical polishing systems

ABSTRACT

An apparatus for supplying chemicals in a chemical mechanical polishing (CMP) process includes a plurality of chemical solution supply sources for supplying different chemical solutions in a pump-less manner by using a pressure applied at the chemical solution supply sources, each supply source having an associated feed line, re-circulating line, and means for measuring and controlling flow rates of the chemical solutions supplied through the feed lines. The chemical solutions are delivered via a plurality of delivery lines to a mixer, thereby providing a mixed chemical solution to a chemical injection part of a polishing apparatus. Each means for measuring and controlling flow rates is mounted in the feed lines.

BACKGROUND OF THE INVENTION

[0001] 1. Field of the Invention

[0002] The present invention generally relates to a chemical mechanicalpolishing (CMP) system and, more particularly, to a chemical supplyapparatus and method in the CMP system.

[0003] 2. Background of the Invention

[0004] In the manufacturing of high-density integrated circuits,effective device isolation typically requires a global planarizationprocess step in order to implement multilevel interconnections. Achemical mechanical polishing (CMP) technique is an effective way toachieve such planarization. Such polishing methods are well known tothose skilled in the art and include the steps of closely attaching oneside of a wafer to a carrier or a flat surface of a chuck andpressurizing the other side of the wafer toward a flat polishingsurface.

[0005] During CMP processes, however, micro-scratches are created on asemiconductor wafer surface. These micro-scratches may cause degradationof product quality and yield. The major causes of the micro-scratchesare the intrinsic characteristics of a slurry supply apparatus and acharacteristic change in a slurry resulting from shear stressesgenerated in the CMP system.

[0006] A slurry supply apparatus in a conventional CMP system usesperistaltic pumps in order to feed polishing chemicals onto asemiconductor wafer.

[0007]FIG. 1 illustrates a cross-sectional view of a peristaltic pump400 used in a slurry supply apparatus in a conventional CMP system.Slurry is supplied through a flexible tube 410. The slurry stays in theflexible tube 410 and makes no contact with any part of the peristalticpump 400. One end of the flexible tube 410 is connected to an input partof the peristaltic pump 400, and the other end is connected to an outputpart of the peripheral pump 400. Because the flexible tube 410 isabraded by repeated shrinkage and extension, the peristaltic pump 400suffers from a danger of slurry leakage due to degradations, such ascracking or breakage, in the flexible tube 410 inside the peristalticpump 400. In order to reduce this danger, the flexible tube 410 isfrequently exchanged with a new flexible tube.

[0008] Another drawback with conventional CMP systems is that pressuresgenerated while driving the peristaltic pump 400 cakes particles in theslurry to clog a pipe or the flexible tube 410. Moreover, grainsproduced by contaminants or slurry caked by tube abrasion may besupplied onto a wafer to cause process defects.

[0009] As described above, in a slurry supply apparatus using theperistaltic pump 400, a flexible tube is abraded to cause tube failure,and frequent tube exchange lowers a system's operating rate andincreases the cost of operation. Moreover, an accuracy of the CMPprocess is lowered due to the use of the peristaltic pump 410.

[0010] Therefore, a current CMP process trend is to use chemicaladditives to form mixed slurries (e.g., ceria slurry, alumina slurry,etc.). Unfortunately, the chemical additive mixed slurry or slurry usinga chemical element without a polishing element results in a settlingphenomenon or a particle coagulation phenomenon that becomes more severewith the lapse of time than in the case with silica slurry. Since mostcurrent slurry supply apparatuses have a supply-following-mixturestructure, they are not suitable for supplying the chemical additivemixed slurry.

SUMMARY OF THE INVENTION

[0011] A feature of an embodiment of the present invention is to providea chemical supply apparatus and method in a semiconductor manufacturingprocess, using a self-supply pressure generated during chemical supplywithout a pump for forcibly supplying a chemical.

[0012] Another feature of an embodiment of the present invention is toprovide a chemical supply apparatus and method in a semiconductormanufacturing process, that enables a chemical additive mixed slurry tosuppress a settling phenomenon or a coagulation phenomenon that occurswith the lapse of time.

[0013] According to an aspect of the present invention, a chemicalsupply apparatus supplies a constant amount of chemical to a chemicalinjection part using a pressure of a pump-less chemical supply source.Means for measuring and controlling is mounted in a feed line to measureand control a flow rate of the supplied chemical in a proportionalintegral derivative (PID) automatic control manner.

[0014] In a preferred embodiment, the feed line further comprises arecycle line for preventing coagulation of the chemical and a branchline connected to the recycle line. The recycle line is preferablyconnected to the chemical supply source, and the branch line isconnected to the chemical injection part via a measuring/controllingmeans. The measuring/controlling means comprises a flow rate controlvalve, a detector for detecting the flow rate of a chemical solution andgenerating flow rate data signals, and a controller for receiving theflow rate data signals and comparing the flow rate data signals with areference flow rate data signal in order to output a control signal forcontrolling a degree of opening the flow rate control valve. Thedetector is mounted in or upon the feed line of the flow rate controlvalve

[0015] According to a second embodiment of the present invention, anapparatus for supplying chemicals to a chemical injection part in asemiconductor manufacturing process comprises a plurality of chemicalsupply sources, each chemical supply source containing a differentchemical solution, and a plurality of associated feed lines. Thechemical solutions are preferably injected from the chemical supplysources to the chemical injection part using a pressure at the chemicalsupply sources. Flow is controlled using a means formeasuring/controlling flow rates of the chemical solutions supplied tothe chemical injection part. The measuring/controlling means may bemounted in or upon each of the feed lines.

[0016] In the second embodiment, each of the chemical solution feedlines comprises a recycle line for preventing coagulation of thechemical solution and a branch line branching from the recycle line. Therecycle line is connected to the chemical supply source, and the branchline is connected to the chemical injection part.

[0017] A chemical supply method using the chemical supply apparatusaccording to the second embodiment of the present invention comprisesthe steps of providing a pressure to a plurality of chemical supplysources, respectively carrying chemical solutions from the chemicalsupply sources to a plurality of feed lines using the pressure,respectively measuring/controlling flow rates of the chemical solutionscarried through the feed lines, and mixing the measured/controlledchemical solutions just before being supplied to the chemical injectionpart.

[0018] In the embodiments, the step of measuring/controlling the flowrates comprises the steps of detecting a flow rate of a chemicalsolution flowing into the feed line, receiving a data signalcorresponding to the detected flow rate and comparing the data signalwith a reference flow rate data signal in order to output a controlsignal for controlling a degree of opening a flow rate control valve inorder to control the flow rate of the chemical solution.

[0019] These and other features of the present invention will be readilyapparent to those of ordinary skill in the art upon review of thedetailed description that follows.

BRIEF DESCRIPTION OF THE DRAWINGS

[0020]FIG. 1 illustrates a cross-sectional view of a polishing solutioncarry type metering pump that is generally used in a conventional CMPsystem.

[0021]FIG. 2 illustrates a top plan view of an exemplary CMP system witha chemical supply apparatus according to the present invention.

[0022]FIG. 3 illustrates a block diagram showing a detailed example of achemical supply apparatus according to a first embodiment of the presentinvention.

[0023]FIG. 4 illustrates a block diagram showing a detailed example of achemical supply apparatus according to a second embodiment of thepresent invention.

[0024]FIG. 5 illustrates a flowchart showing chemical supply stepsaccording to the present invention.

DESCRIPTION OF THE PREFERRED EMBODIMENT

[0025] Korean Patent Application No. 2001-70139, entitled DEVICE FORSUPPLYING CHEMICAL TO SLURRY MECHNICAL POLISHING APPARATUS AND METHODTHEREOF, filed on Nov. 12, 2001, is incorporated by reference herein inits entirety.

[0026]FIGS. 2 and 3 illustrate a top view and a block diagram,respectively, of an exemplary CMP system having a chemical supplyapparatus according to a first embodiment of the present invention. Inthe CMP system of FIG. 2, a layer of a wafer to be planarized ispolished using chemical and mechanical actions.

[0027] As shown in FIG. 2, the CMP system 100 includes a wafer carryingunit 20 for loading/unloading a wafer on a cassette, a polishing station30 having a plurality of rotate-able turntables 32 and a polishing headassembly 34, a cleaner station 40 for cleaning contaminants that remainafter a polishing process, transfer robots 50 for sequentiallytransferring each of a plurality of wafers, and a slurry supply device200. A polishing pad is closely attached to the turntable 32 on a sidetoward the wafer to be polished.

[0028] The turntable 32 is coupled to a turntable rotating mechanism(not shown) that rotates the turntable 32 at an exemplary 50-80 rpm inan ideal polishing condition, although a higher rotation speed may beused. Polishing station 30 preferably has a conventionalpad-conditioning means 36 and a slurry injection nozzle 38 for injectinga slurry onto a surface of the polishing pad. The polishing station 30and the polishing head assembly 34 are well known to those skilled inthe art and will not be explained in further detail.

[0029] The slurry preferably contains a reaction reagent (e.g.,de-ionized wafer for oxidation polishing), friction particles (e.g.,silicon dioxide for oxidation polishing), and a chemical additive orreaction catalyst (e.g., potassium hydroxide for oxidation polishing).The slurry is received from the slurry supply device 200. As shown inFIG. 3, a chemical supply device 200 according to the present inventioncomprises a chemical supply source 210, a feed line 220, and a flow ratecontrol unit 230 for regulating the flow to polishing station 30.

[0030] Chemical supply source 210 supplies a chemical solution into thefeed line 220. That is, the chemical solution flows into the feed line220 by means of a chemical discharge force (pressure), which may begenerated by forcible gas injection. The chemical solution may be afully-mixed slurry or a chemical component of a slurry to allow theflexibility of mixing the slurry at a node closer to slurry injectionnozzle 38 to aid in a de-coagulation of particulates as will be detailedbelow in an alternate embodiment.

[0031] The feed line 220 has a recycle line 222 and a branch line 224.The recycle line 222 is coupled to the chemical supply source 210 andprevents coagulation of the chemical solution by continuouslyre-circulating the chemical solution until applied at the point of use.Branch line 224 branches from the recycle line 222, and is coupled toflow rate control unit 230 and thence to slurry injection nozzle 38 ofpolishing station 30 via a delivery branch line 224 a. A filter (notshown) for filtering thick particles contained in the chemical solutionmay be included in feed line 220.

[0032] Flow rate control unit 230 further comprises a flow rate controlvalve 232, a flow rate detector 234, and a controller 236. Flow ratedetector 234 measures a flow rate of the chemical solution that issupplied to slurry injection nozzle 38 through flow rate control valve232. An electrical signal corresponding to a flow rate of the measuredchemical solution is applied to controller 236. According to the firstembodiment of the present invention, flow rate detector 234 may be anymeasuring device, including non-contact measurement devices, e.g.,sound, light, etc., and contact measurement devices, e.g., chemicalcontacting types of flow detectors. Controller 236 analyzes flow ratedata provided from the flow rate detector 234, and then determineswhether the flow rate exceeds a permissible error range. When the flowrate exceeds the permissible error range, a control signal forcontrolling a degree of opening the flow rate control valve 232 isoutputted in real time. Thus, flow rate control valve 232 isautomatically controlled to constantly maintain a predetermined amountof chemical solution at slurry injection nozzle 38. Controller 236 mayalso generate an alarm, stop the CMP process, or take other suitableactions. For example, controller 236 feeds back the flow rate andpreferably employs a proportional integral derivative (PID) automaticcontrol scheme.

[0033] Controller 236 may also include a CMP system control computer 238for controlling general operations of the entire CMP process. Controlcomputer 238 may be connected to a monitor 239 that enables an operatorto view a flow rate control operation.

[0034] As described above, because a chemical solution is preferablysupplied using a pressure of a pumpless chemical supply source, a pumpor the like is not mounted in the feed lines. Instead, gas injection isused to introduce a chemical solution, and re-circulation of thechemical solution in the re-circulation lines is made possible by thegas injection without the use of a pump. This makes it possible tosuppress the formation of scratches, an occurrence of a coagulationphenomenon, or the introduction or creation of contaminants.

[0035] According to the present invention, slurry supply device 200 mayinclude a plurality of chemical supply sources 210. It will beappreciated that a slurry supply device according to the presentinvention may include combinations of a plurality of chemical supplysources, a plurality of feed lines, and a plurality of flow rate controlunits. Although it is preferable that a single controller 236 controlthe general operations of a single flow rate control valve 232, aplurality of controllers may be used. Alternatively, a single controller236 may control multiple flow rate control valves 232.

[0036]FIG. 4 illustrates an exemplary slurry supply device according toa second embodiment of the present invention. As shown in FIG. 4, aslurry supply device 300 can mix and supply a plurality of differentkinds of chemicals. The slurry supply device 300 has, respectively,first and second chemical supply sources 310 a and 310 b, first andsecond feed lines 320 a and 320 b, first and second flow rate controlunits 330 a and 330 b, first and second delivery branch lines 324 c and324 d, and a mixer 340. Each of the chemical supply sources 310 a and310 b, the recycle lines 322 a and 322 b, the feed lines 320 a and 320 bwith branch lines 324 a and 324 b, and the flow rate control units 330 aand 330 b, with associated valves 332, sensors 334, controllers 336,computers 338, and monitors 339 have the same structure and function assimilar elements in chemical supply device 200 according to the firstembodiment. Therefore, they will not be explained in further detail.

[0037] According to the second embodiment, a delivery branch line 324 dof the second feed line 320 b and second control unit 330 b is coupledto delivery branch line 324 c of the first feed line 320 a. Firstcontrol unit 330 a with mixer 340 is installed as the coupling part inorder to mix first and second chemical solutions with each other justbefore supplying the first and second chemical solutions to slurryinjection nozzle 38 of polishing station 30 via delivery branch line 324e. The first and second chemical solutions may be a polishing agent anda chemical additive, respectively.

[0038] In slurry supply device 300, the first chemical supply source 310a preferably contains a polishing agent (friction particles), and thesecond chemical supply source 310 b preferably contains a chemicaladditive (or chemical reaction catalyst) to be mixed with the polishingagent. The first and second feed lines 320 a and 320 b, respectively,are coupled to first and second chemical supply sources 310 a and 310 b,respectively. The relative amounts of the polishing agent and thechemical additive are controlled by flow rate control units 330 a and330 b mounted on the branch lines 324 a and 324 b, respectively.Thereafter, the polishing agent and the chemical additive are mixed witheach other in mixer 340 that is preferably close to slurry injectionnozzle 38. For example, a mixing ratio of the polishing agent to thechemical additive is preferably 1:2. Controlling the mixing ratio can beaccomplished by adjusting a setting value.

[0039] A method for supplying slurry according to the present inventionis described below with reference to a flowchart shown in FIG. 5 for thesecond embodiment shown in FIG. 4. Although the method described belowrelates to the second embodiment, the steps may be used and applied byone skilled in the art to the processes of the first embodiment.

[0040] A pressure is provided to first and second chemical supplysources 310 a and 310 b, respectively, in step S10. A polishing agentand a chemical additive are carried from the first and second chemicalsupply sources 310 a and 310 b to feed lines 310 a and 320 b,respectively, by the pressure in step S20. Flow rates of the polishingagent and chemical additive are controlled in flow rate control units330 a and 330 b, respectively, in step S30.

[0041] The flow step “S30” is described in detail as follows. The flowrates are detected in flow rate detectors 334, respectively, in stepS31. Electric signals of the detected flow rates are analyzed incontrollers 336, respectively, in step S32. Determination is made as towhether the analyzed flow rates exceed a permissible error range in stepS33. If flow rates exceed the permissible error range, a control signalfor controlling a degree of opening a flow rate control valve 332 inreal time is outputted in step S34. The flow rate control valve 332 iscontrolled by the control signal from the controller 336 in step S35. Ifthe flow rate is not exceeded, the first and second chemicals are mixedwith each other in a mixer 340 in step S40. The analyzed flow rates maybe outputted through a monitor 339. Just before supplying the controlledpolishing agent and chemical additive to the slurry injection nozzle 38,they are mixed with each other in mixer 340. A mixed chemical issupplied to chemical injection nozzle 38 in step S50.

[0042] According to the second embodiment, slurry supply device 300 hasa supply-following-mixture structure. That is, just before supplyingdifferent chemicals to the slurry injection nozzle, they are mixed witheach other in the mixer 340. Therefore, slurry supply device 300 issuitable for supplying chemical additive-mixed slurry (e.g., ceriaslurry, alumina slurry, etc.) or a slurry using a chemical elementwithout a polishing element. In addition, slurry supply device 300 isused to overcome a settling phenomenon or a coagulation phenomenon thatoccurs in the use of silica slurry.

[0043] A preferred embodiment of the present invention has beendisclosed herein and, although specific terms are employed, they areused and are to be interpreted in a generic and descriptive sense onlyand not for purpose of limitation. Accordingly, it will be understood bythose of ordinary skill in the art that various changes in form anddetails may be made without departing from the spirit and scope of theinvention as set forth in the following claims

What is claimed is:
 1. An apparatus for supplying a chemical solution toa chemical injection part in a semiconductor manufacturing process,comprising: a chemical solution supply source; a feed line in which thechemical solution is supplied from the chemical solution supply sourceto the chemical solution injection part using a pressure of the chemicalsolution supply source; and means for measuring/controlling a flow rateof the supplied chemical solution, the measuring/controlling means beingmounted in the feed line, wherein the feed line comprises: a recycleline for preventing coagulation of the chemical solution, the recycleline being connected to the chemical solution supply source; and abranch line branching from the recycle line, the branch line beingconnected to the chemical solution injection part, and wherein the meansfor measuring/controlling the flow rate of the supplied chemicalsolution comprises: a flow rate control valve; a detector for detectingthe flow rate of the chemical solution and generating a flow rate datasignal, the detector being mounted in the feed line of the flow ratecontrol valve; and a controller for receiving the flow rate data signaland comparing the flow rate data signal with a reference flow rate datasignal in order to output a control signal for controlling a degree ofopening the flow rate control valve.
 2. An apparatus as claimed in claim1, wherein the controller comprises a proportional integral derivative(PID) automatic controller.
 3. An apparatus as claimed in claim 1,wherein the controller further comprises a display device for displayingthe measured flow rate and an alarm device for warning an operator thatthe measured flow rate is different from a required flow rate.
 4. Anapparatus as claimed in claim 1, wherein the chemical injection part isincluded in a polishing apparatus having a rotate-able turntable and apolishing pad.
 5. An apparatus as claimed in claim 1, wherein thechemical solution is a slurry comprising one or more from the groupconsisting of a reaction reagent, friction particles, and a chemicalreaction catalyst.
 6. An apparatus for supplying a chemical solution toa chemical injection part in a semiconductor manufacturing process,comprising: a plurality of chemical solution supply sources, each sourcesupplying a different chemical solution; a plurality of feed lines intowhich the chemical solutions are injected from the chemical solutionsupply sources to the chemical injection part by a pressure of thechemical solution supply sources; and a means for measuring/controllingflow rates of the chemical solutions supplied to the chemical solutioninjection part, the means for measuring/controlling flow rates beingmounted in each of the feed lines.
 7. An apparatus as claimed in claim6, wherein the chemical solutions are mixed with each other just beforebeing supplied to the chemical solution injection part.
 8. An apparatusas claimed in claim 6, wherein each one of the plurality of feed linesfurther comprises: a recycle line for preventing coagulation of thechemical solution, the recycle line being connected to an associatedchemical solution supply source; and a branch line branching from therecycle line, the branch line being connected to an associated chemicalsolution injection part.
 9. An apparatus as claimed in claim 8, whereinthe branch lines of each one of the plurality of feed lines are coupledby a coupling part to a single line just before supplying the chemicalsolutions to the chemical solution injection part, and wherein thecoupling part is adjacent the chemical solution injection part.
 10. Anapparatus as claimed in claim 9, further comprising a mixer for mixingthe chemical solutions with each other, the mixer being installed at thecoupling part.
 11. An apparatus as claimed in claim 6, wherein each oneof the plurality of chemical solutions comprises one or more from thegroup consisting of a polishing agent, a chemical additive mixed withthe polishing agent, and de-ionized (Dl) water.
 12. An apparatus asclaimed in claim 6, wherein each of the measuring/controlling meanscomprises: a flow rate control valve; a detector for detecting the flowrate of the associated chemical solution, the detector being mounted inthe feed line of the flow rate control valve; and a controller forreceiving a flow rate data signal and comparing the flow rate datasignal with reference flow rate data signal in order to output a controlsignal for controlling a degree of opening the flow rate control valve.13. An apparatus as claimed in claim 12, wherein the controllercomprises a proportional integral derivative (PID) automatic controller.14. An apparatus as claimed in claim 12, wherein each one of thecontrollers further comprises a display device for displaying themeasured flow rate and an alarm device for warning an operator that themeasured flow rate is different from a required flow rate.
 15. Anapparatus as claimed in claim 6, wherein the chemical solution injectionpart is included in a polishing apparatus having a rotate-able turntableand a polishing pad.
 16. A method of supplying chemical solutions usingthe apparatus claimed in claim 6, comprising the steps of: respectivelyproviding a pressure to a plurality of chemical solution supply sources;respectively carrying chemical solutions from the chemical supplysources to a plurality of feed lines using the pressure; andrespectively measuring/controlling flow rates of the chemical solutionscarried through the feed lines.
 17. A method of supplying chemicalsolutions as claimed in claim 16, further comprising a step of mixingthe measured/controlled chemical solutions just before supplying thechemical solutions to the chemical solution injection part.
 18. A methodas claimed in claim 16, wherein the step of respectivelymeasuring/controlling the flow rates comprises the steps of: detectingflow rates of chemical solutions flowing into the feed lines andgenerating flow rate data signals indicating the detected flow rates ofeach respective chemical solution; receiving flow rate data signalsindicating the detected flow rates of each respective chemical solutionand comparing the flow rate data signals with reference flow rate datasignals in order to output control signals for controlling flow ratecontrol valves of each respective chemical solution; and controlling theflow rate control valves by means of the control signals to control theflow rate of the chemical solutions.
 19. A method as claimed in claim18, further comprising a step of displaying the measured flow rates. 20.A method as claimed in claim 18, further comprising a step of generatingan alarm for warning an operator when any measured flow rate exceeds apermissible error range of a required flow rate.